The Calibre platform is the main link between IC design and production. It is central to the Design Center - Factory - IP Vendor - Interfaces ecosystem.

Successful design and production of advanced ICs of several billion gates at technology norms approaching 3-5nm is impossible without accurate and high-performance physical verification of the topology according to certified rule files, including specialized tools to improve yield, control of consistency of the implemented topology with the original circuit, exhaustive extraction of spurious parameters for final simulation, special topology optical correction measures for making photostructures and other features. All of the above features are included in the Calibre toolbox. With industry-leading performance and verification accuracy, low memory and disk space requirements, and innovative sub-nanometer solutions (PERC, Patte Matching, etc.), Calibre is the gold standard for most leading design centers and semiconductor factories.

Calibre product family

Verification and DFM (pre-tapeout)

Production preparation (post-tapeout)

Computational methods of photolithography correction

Calibre nmOPC

Optical topology correction to increase the resolution of the photolithography process.

Calibre nmSRAF

Incorporating additional elements (SRAF) into the topology to increase the resolution of the photolithography process.

Calibre OPCverify

Accurate modeling of the results of optical correction (Calibre nmOPC) and its effect on the photolithography process./dd>

Calibre WORKbench

An environment that provides a user interface for running optical correction applications and viewing their results.

Calibre nmModelflow

Application for precise calibration of optical models, photoresist models and etch models.

Calibre pxOPC

Fast optical correction based on inverse pixel patterns.

Calibre pxSMO and RET selection

Application for optimizing the light source parameters in the photolithographic process.

Mask preparation

Calibre MPCpro

The application is intended for correcting a mask based on the specified rules of linearity effects, through-shift, line-end shorting, and overall layer density.

Calibre nmMPC

Dose and geometry correction of the photomask based on dosage, exposure, resist and process models.

Calibre MPCverify

Verifies the results of the photomask correction based on the model library.