Calibre LFD (Litho Friendly Design) simulates the impact of lithography process parameter variations on die yield. The application performs three key tasks:

• Collects information about how a patte will print not only under ideal lithography conditions but also under various process variations (defocus, dose deviation, mask misalignment, etc.)
• Based on this data, identifies areas at risk of manufacturing defects
• Provides automated hotspot correction guidance to improve yield